DocumentCode :
3149356
Title :
Material characterization during the fabrication of silicon nuclear detectors
Author :
Fontaine, J. Ch ; Barthe, S. ; Ponpon, J.P. ; Schunck, J.P. ; Siffert, P.
Author_Institution :
Centre de Recherches Nucl., Strasbourg, France
fYear :
1991
fDate :
9-12 Sep 1991
Firstpage :
84
Lastpage :
88
Abstract :
A method based on the photoconductive decay under pulsed infrared illumination has been developed to determine both the bulk minority carrier lifetime and the surface recombination velocity of thermally oxidized silicon samples. The usefulness of the method has been illustrated with two examples: control of the process during the various technological steps used to prepare nuclear radiation detectors and evaluation of bulk and surface degradation during neutron irradiation of silicon wafers used to make detectors
Keywords :
carrier lifetime; electron-hole recombination; elemental semiconductors; minority carriers; neutron detection and measurement; neutron effects; semiconductor counters; silicon; Si; bulk minority carrier lifetime; neutron irradiation; nuclear detectors; photoconductive decay; pulsed infrared illumination; radiation detectors; surface degradation; surface recombination velocity; thermal oxidation; Charge carrier lifetime; Fabrication; Lighting; Neutrons; Photoconducting materials; Photoconductivity; Process control; Radiation detectors; Silicon; Thermal degradation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Radiation and its Effects on Devices and Systems, 1991. RADECS 91., First European Conference on
Conference_Location :
La Grande-Motte
Print_ISBN :
0-7803-0208-7
Type :
conf
DOI :
10.1109/RADECS.1991.213602
Filename :
213602
Link To Document :
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