DocumentCode :
31517
Title :
High ON/OFF Ratio and Quantized Conductance in Resistive Switching of {\\rm TiO}_{2} on Silicon
Author :
Chengqing Hu ; McDaniel, Martin D. ; Ekerdt, John G. ; Yu, E.T.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Texas at Austin, Austin, TX, USA
Volume :
34
Issue :
11
fYear :
2013
fDate :
Nov. 2013
Firstpage :
1385
Lastpage :
1387
Abstract :
TiO2 has been investigated extensively as an active resistive switching (RS) material for resistive random access memory. In this letter, single-crystal anatase- TiO2 thin films fabricated on silicon by atomic layer deposition are used to realize highly stable and clean bipolar RS behavior with a record high ON/OFF ratio (~107) and low leakage current in the high-resistance state. The switching characteristics resemble those of electrochemical memories via formation and dissolution of conductive filaments (CFs) composed of oxygen vacancies, and small numbers of quantized channels are reproducibly observed in the low-resistance state, consistent with quantized conductance (QC) found in conventional electrolytic systems and indicating its potential for forming ultrathin CF amenable to device scaling. A detailed analysis of QC and contact resistance is presented. The emergence of QC is believed to be related to the single-crystal nature of the TiO2 thin films.
Keywords :
atomic layer deposition; electrical conductivity; leakage currents; random-access storage; semiconductor thin films; titanium compounds; Si; TiO2; atomic layer deposition; bipolar resistive switching behavior; conductive filaments; contact resistance; leakage current; on/off ratio; oxygen vacancies; quantized conductance; resistive random access memory; resistive switching; single-crystal anatase-TiO2 thin films; switching characteristics; Atomic layer deposition; Epitaxial growth; Metals; Silicon; Switches; Threshold voltage; Conductive filament (CF); metal oxide; nonvolatile memory; quantized conductance (QC); resistive random access memory (RRAM); resistive switching (RS); titanium dioxide;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2013.2282154
Filename :
6615931
Link To Document :
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