Title :
High ON/OFF Ratio and Quantized Conductance in Resistive Switching of
on Silicon
Author :
Chengqing Hu ; McDaniel, Martin D. ; Ekerdt, John G. ; Yu, E.T.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Texas at Austin, Austin, TX, USA
Abstract :
TiO2 has been investigated extensively as an active resistive switching (RS) material for resistive random access memory. In this letter, single-crystal anatase- TiO2 thin films fabricated on silicon by atomic layer deposition are used to realize highly stable and clean bipolar RS behavior with a record high ON/OFF ratio (~107) and low leakage current in the high-resistance state. The switching characteristics resemble those of electrochemical memories via formation and dissolution of conductive filaments (CFs) composed of oxygen vacancies, and small numbers of quantized channels are reproducibly observed in the low-resistance state, consistent with quantized conductance (QC) found in conventional electrolytic systems and indicating its potential for forming ultrathin CF amenable to device scaling. A detailed analysis of QC and contact resistance is presented. The emergence of QC is believed to be related to the single-crystal nature of the TiO2 thin films.
Keywords :
atomic layer deposition; electrical conductivity; leakage currents; random-access storage; semiconductor thin films; titanium compounds; Si; TiO2; atomic layer deposition; bipolar resistive switching behavior; conductive filaments; contact resistance; leakage current; on/off ratio; oxygen vacancies; quantized conductance; resistive random access memory; resistive switching; single-crystal anatase-TiO2 thin films; switching characteristics; Atomic layer deposition; Epitaxial growth; Metals; Silicon; Switches; Threshold voltage; Conductive filament (CF); metal oxide; nonvolatile memory; quantized conductance (QC); resistive random access memory (RRAM); resistive switching (RS); titanium dioxide;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2013.2282154