DocumentCode :
3152332
Title :
Hierarchical Analysis of IC Artwork with User Defined Abstraction Rules
Author :
Scheffer, Louis K. ; Soetarman, Ronny
Author_Institution :
Valid Logic Systems, Incorporated, San Jose, CA
fYear :
1985
fDate :
23-26 June 1985
Firstpage :
293
Lastpage :
298
Abstract :
Hierarchical DRC and component extract offer many advantages but no one form of hierarchical analysis fits all situations. This paper introduces hierarchical analysis in which the user specifies how abstract representations of cells are formed, how they are checked, and what to do if a violation is detected. This allows one analysis program (with different rules) to use the designer´s hierarchy for a wide variety of different analyses. In particular, analyses that had been difficult in previous schemes (cross coupling capacitances, terminals in the center of cells, multi-layer interconnects) can now be handled hierarchically.
Keywords :
Capacitance; Circuit testing; Coupling circuits; Fabrication; Humans; Integrated circuit interconnections; Integrated circuit layout; Integrated circuit testing; Performance analysis; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design Automation, 1985. 22nd Conference on
ISSN :
0738-100X
Print_ISBN :
0-8186-0635-5
Type :
conf
DOI :
10.1109/DAC.1985.1585955
Filename :
1585955
Link To Document :
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