DocumentCode :
3152577
Title :
High precision on-wafer backend capacitor mismatch measurements using a benchtop semiconductor characterization system
Author :
Tuinhout, Hans ; Van Rossem, Fleur ; Wils, Nicole
Author_Institution :
NXP Semicond., Eindhoven
fYear :
2009
fDate :
March 30 2009-April 2 2009
Firstpage :
3
Lastpage :
8
Abstract :
This paper discusses a sophisticated backend capacitor mismatch characterization technique based on direct capacitance measurements with a standard C-V meter, wafer prober subsite moves to measure the two capacitors of each pair sequentially and monitor the measurement noise, and statistics to take this noise appropriately into account. We describe requirements, capabilities and limitations of this approach. It is concluded that this technique proves excellently suited for assessing the matching performance of backend capacitors in the most relevant range of 10 fF to 10 pF.
Keywords :
capacitance measurement; capacitors; noise measurement; backend capacitor mismatch characterization technique; benchtop semiconductor characterization system; capacitance 10 fF to 10 pF; direct capacitance measurement; high precision on-wafer mismatch measurements; noise measurement; Capacitance measurement; Capacitance-voltage characteristics; Capacitors; Circuit testing; Current measurement; Fluctuations; Measurement standards; Noise measurement; Semiconductor device noise; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronic Test Structures, 2009. ICMTS 2009. IEEE International Conference on
Conference_Location :
Oxnard, CA
Print_ISBN :
978-1-4244-4259-1
Type :
conf
DOI :
10.1109/ICMTS.2009.4814598
Filename :
4814598
Link To Document :
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