DocumentCode :
3152979
Title :
A Test Structure for Statistical Evaluation of Characteristics Variability in a Very Large Number of MOSFETs
Author :
Watabe, S. ; Sugawa, S. ; Abe, K. ; Fujisawa, T. ; Miyamoto, N. ; Teramoto, A. ; Ohmi, T.
Author_Institution :
Grad. Sch. of Eng., Tohoku Univ., Sendai
fYear :
2009
fDate :
March 30 2009-April 2 2009
Firstpage :
114
Lastpage :
118
Abstract :
We have proposed and developed a test structure for evaluating electrical characteristics variability of a large number of MOSFETs in very short time using very simple circuit structure. The electrical characteristics such as threshold voltage, subthreshold swings S-factors, random telegraph signal noise, and so on, can be measured in over one million MOSFETs. This new test structure circuit and results measured by this circuit are very efficient in developing processes, process equipment and device structure which suppress variability.
Keywords :
MOSFET; semiconductor device measurement; semiconductor device testing; statistical analysis; MOSFET; electrical characteristics variability; statistical evaluation; test structure circuit; Circuit testing; Current measurement; Electric variables; Electric variables measurement; Integrated circuit measurements; MOSFETs; Shift registers; Switches; Switching circuits; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronic Test Structures, 2009. ICMTS 2009. IEEE International Conference on
Conference_Location :
Oxnard, CA
Print_ISBN :
978-1-4244-4259-1
Type :
conf
DOI :
10.1109/ICMTS.2009.4814622
Filename :
4814622
Link To Document :
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