Title :
Four point probe structures with buried electrodes for the electrical characterization of ultrathin conducting films
Author :
Groenland, A.W. ; Wolters, R.A.M. ; Kovalgin, A.Y. ; Schmitz, J.
Author_Institution :
MESA & Inst. for Nanotechnol., Univ. of Twente, Enschede
fDate :
March 30 2009-April 2 2009
Abstract :
Test structures for the electrical characterization of ultrathin conductive (ALD) films are presented based on buried electrodes on which the ultrathin film is deposited. This work includes test structure design and fabrication, and the electrical characterization of ALD TiN films down to 4 nm. It is shown that these structures can be used successfully to characterize sub 10 nm films.
Keywords :
conducting materials; materials testing; titanium compounds; vapour deposited coatings; ALD film; TiN; buried electrode; electrical characterization; four point probe structure; test structure design; test structure fabrication; ultrathin conducting film; Conductive films; Electrodes; Fabrication; Probes; Semiconductor films; Sputter etching; Testing; Tin; Transistors; Wet etching;
Conference_Titel :
Microelectronic Test Structures, 2009. ICMTS 2009. IEEE International Conference on
Conference_Location :
Oxnard, CA
Print_ISBN :
978-1-4244-4259-1
DOI :
10.1109/ICMTS.2009.4814639
