• DocumentCode
    3153323
  • Title

    Fast Embedded Characterization of FEOL Variations in MOS Devices

  • Author

    Rigaud, F. ; Portal, J.M. ; Dreux, P. ; Vast, J. ; Aziza, H. ; Bas, G.

  • Author_Institution
    Lab. Mater. et Microelectron. de Provence, CNRS, Marseille
  • fYear
    2009
  • fDate
    March 30 2009-April 2 2009
  • Firstpage
    205
  • Lastpage
    208
  • Abstract
    The objective of this paper is to present a test chip based on embedded ring oscillators (RO) measurement with its associated extraction algorithm to characterize length and width variations and to discriminate them from others FEOL variations. A brief overview of the structure, designed in a ST-Microelectronics 90nm technology, is given with emphasis on the ROs geometry with their biasing conditions and the measurement circuit. Comparison of simulated values versus estimated ones is given and confirms the ability of the structure to characterize FEOL variations. MOS width and length are well estimated regardless the others FEOL deviations that can be also detected.
  • Keywords
    MOSFET; digital integrated circuits; nanoelectronics; oscillators; semiconductor device measurement; semiconductor device models; semiconductor device testing; FEOL variation; MOS device width; ST-microelectronics design; associated extraction algorithm; embedded RO measurement circuit; embedded ring oscillator test structure; size 90 nm; Circuit testing; Counting circuits; Frequency measurement; Geometry; MOS devices; Manufacturing processes; Ring oscillators; Semiconductor device manufacture; Semiconductor device measurement; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronic Test Structures, 2009. ICMTS 2009. IEEE International Conference on
  • Conference_Location
    Oxnard, CA
  • Print_ISBN
    978-1-4244-4259-1
  • Type

    conf

  • DOI
    10.1109/ICMTS.2009.4814642
  • Filename
    4814642