DocumentCode :
315603
Title :
Size dependent phenomena during the formation of Gd and Fe silicide thin films
Author :
Molnár, G.L. ; Peto, G. ; Horváth, Z.E. ; Zsoldos, E. ; Khánh, N.Q.
Author_Institution :
KFKI Res. Inst. for Mater. Sci., Budapest, Hungary
fYear :
1997
fDate :
16-19 March 1997
Firstpage :
196
Lastpage :
197
Abstract :
The purpose of this work is to study the effect of film thickness on the evolution of reaction product in case of two different type metals (gadolinium and iron) silicide, in order to develop a kind of phase formation engineering.
Keywords :
chemical interdiffusion; gadolinium compounds; iron compounds; metallic thin films; FeSi; GdSi; metal silicide thin film formation; phase formation engineering; reaction product; Annealing; Iron; Semiconductor films; Semiconductor materials; Semiconductor thin films; Silicides; Silicon; Solids; Substrates; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop
Conference_Location :
Villard de Lans, France
ISSN :
1266-0167
Type :
conf
DOI :
10.1109/MAM.1997.621118
Filename :
621118
Link To Document :
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