DocumentCode :
3156958
Title :
Linear, Noise and Nonlinear HF Models for Advanced CMOS Technology
Author :
Danneville, F. ; Pailloncy, G. ; Siligaris, A. ; Gloria, D. ; Dambrine, Gilles
Author_Institution :
IEMN CNRS UMR, Villeneuve d´´ascq
fYear :
2006
fDate :
10-13 Sept. 2006
Firstpage :
209
Lastpage :
212
Abstract :
Deep CMOS technology requires more and more accurate and robust RF CMOS models (PSP, BSIM, EKV...) for circuit design, predictable down to millimetrique wave range. Because of their scalability, these models are the more convenient ones, their major drawback being the huge number of parameters to experimentally extract, which is costly and time consuming. Hence, whenever CMOS technology is under development, it looks interesting to investigate another approach. For this purpose, we propose in this work to show the usefulness of several in-house RF oriented models, fast to extract, to investigate the AC and noise properties of a 65 nm bulk CMOS technology. An extension is also proposed through the presentation of a large signal model, for which an application was carried out considering a 130 nm CMOS SOI technology
Keywords :
CMOS integrated circuits; integrated circuit modelling; integrated circuit noise; silicon-on-insulator; 130 nm; 65 nm; CMOS SOI technology; CMOS technology; RF CMOS models; linear HF models; noise properties; nonlinear HF models; signal model; CMOS technology; Circuit synthesis; Hafnium; Integrated circuit modeling; Integrated circuit noise; Microelectronics; Radio frequency; Semiconductor device modeling; Temperature; Tin; 65 nm CMOS Technology; HF Linear and Nonlinear Modeling; HF Noise;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
European Microwave Integrated Circuits Conference, 2006. The 1st
Conference_Location :
Manchester
Print_ISBN :
2-9600551-8-7
Type :
conf
DOI :
10.1109/EMICC.2006.282789
Filename :
4057612
Link To Document :
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