Title :
Advanced Process Modules for (sub-) 45nm Analog/RF CMOS - Technology Description and Modeling Challenges
Author :
Decoutere, S. ; Subramanian, V. ; Loo, J. ; Gustin, C. ; Parvais, B. ; Dehan, M. ; Mercha, A.
Author_Institution :
IMEC, Leuven
Abstract :
The new process module and device architecture options emerging for (sub-) 45nm CMOS lead to both opportunities and challenges for analog/RF circuit design. A survey is given describing the advanced process modules for competing architectures (planar bulk CMOS versus FinFETS), for different gate stacks and mobility enhancement techniques. Challenges for compact modeling are identified
Keywords :
CMOS analogue integrated circuits; integrated circuit modelling; radiofrequency integrated circuits; FinFETS; advanced process modules; analog/RF CMOS; gate stacks; mobility enhancement techniques; planar bulk CMOS; Analog integrated circuits; CMOS analog integrated circuits; CMOS process; CMOS technology; FinFETs; Integrated circuit modeling; Integrated circuit technology; Radio frequency; Radiofrequency identification; Semiconductor device modeling; Analog integrated circuits; Millimeter wave circuits;
Conference_Titel :
European Microwave Integrated Circuits Conference, 2006. The 1st
Conference_Location :
Manchester
Print_ISBN :
2-9600551-8-7
DOI :
10.1109/EMICC.2006.282792
