• DocumentCode
    3157272
  • Title

    Improving a soldering process applying the dual response approach to a Taguchi´s orthogonal array

  • Author

    Hijar-Rivera, H. ; Sanchez-Leal, J. ; Valles-Chavez, Adan

  • Author_Institution
    Juarez Inst. of Technol., Mexico
  • fYear
    2009
  • fDate
    6-9 July 2009
  • Firstpage
    1174
  • Lastpage
    1178
  • Abstract
    Taguchi methodology for robust parameter design has generated both extraordinary interest due to numerous successful applications and much debate due to some limitations such as shortcomings to measure variability with the signal to noise ratio. In response surface methodology the dual response surface approach has been successfully applied as an alternative to Taguchi´s approach. The dual response surface approach uses separate regression models to describe the behavior of the mean and the variance of the response. This article presents an application of Taguchi´s robust parameter design to reduce the number of defectives in a solder process. The Taguchi methodology was used to find the appropriate settings for the robust parameters or factors. Then, looking to overcome the possible problems of the signal to noise ratio and trying to obtain a better solution, the dual response surface approach was applied to the same Taguchi´s crossed array.
  • Keywords
    Taguchi methods; product design; regression analysis; response surface methodology; soldering; Taguchi crossed array; Taguchi methodology; Taguchi orthogonal array; dual response surface; regression model; response surface methodology; robust parameter design; signal-to-noise ratio; soldering process; Noise level; Noise measurement; Noise robustness; Petroleum; Response surface methodology; Robust control; Signal design; Signal generators; Signal to noise ratio; Soldering; Taguchi methodology; approach; design of experiments; dual response surface; orthogonal array; response surface methodology; robust parameter design;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Computers & Industrial Engineering, 2009. CIE 2009. International Conference on
  • Conference_Location
    Troyes
  • Print_ISBN
    978-1-4244-4135-8
  • Electronic_ISBN
    978-1-4244-4136-5
  • Type

    conf

  • DOI
    10.1109/ICCIE.2009.5223949
  • Filename
    5223949