End field structures for linear/helical insertion devices

Author

Chavanne, J. ; Elleaume, P. ; Van Vaerenbergh, P.

Author_Institution

ESRF, Grenoble, France

Volume

4

fYear

1999

fDate

1999

Firstpage

2665

Abstract

The field integral tolerances required on third generation synchrotron sources are of the order of 10-20 Gcm in the whole gap range of an insertion device. This can be achieved without electromagnet correction by a proper magnetic design of the field termination. The paper describes several such end field terminations to be used for planar undulators. A new termination valid for an APPLE II undulator is presented which produces a field integral variation smaller than 20 Gcm for any useful setting of the magnetic gap and phase. It compares quite favorably with other known type of terminations

Keywords

electron accelerators; storage rings; wigglers; APPLE II undulator; end field structures; field integral tolerances; field integral variation; field termination; helical insertion devices; linear insertion devices; magnetic gap; planar undulators; third generation synchrotron sources; Extremities; Magnetic anisotropy; Magnetic devices; Magnetic field measurement; Magnetization; Manufacturing processes; Permanent magnets; Permeability; Perpendicular magnetic anisotropy; Undulators;

fLanguage

English

Publisher

ieee

Conference_Titel

Particle Accelerator Conference, 1999. Proceedings of the 1999

Conference_Location

New York, NY

Print_ISBN

0-7803-5573-3

Type

conf

DOI

10.1109/PAC.1999.792897

Filename

792897