DocumentCode :
3158686
Title :
End field structures for linear/helical insertion devices
Author :
Chavanne, J. ; Elleaume, P. ; Van Vaerenbergh, P.
Author_Institution :
ESRF, Grenoble, France
Volume :
4
fYear :
1999
fDate :
1999
Firstpage :
2665
Abstract :
The field integral tolerances required on third generation synchrotron sources are of the order of 10-20 Gcm in the whole gap range of an insertion device. This can be achieved without electromagnet correction by a proper magnetic design of the field termination. The paper describes several such end field terminations to be used for planar undulators. A new termination valid for an APPLE II undulator is presented which produces a field integral variation smaller than 20 Gcm for any useful setting of the magnetic gap and phase. It compares quite favorably with other known type of terminations
Keywords :
electron accelerators; storage rings; wigglers; APPLE II undulator; end field structures; field integral tolerances; field integral variation; field termination; helical insertion devices; linear insertion devices; magnetic gap; planar undulators; third generation synchrotron sources; Extremities; Magnetic anisotropy; Magnetic devices; Magnetic field measurement; Magnetization; Manufacturing processes; Permanent magnets; Permeability; Perpendicular magnetic anisotropy; Undulators;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Particle Accelerator Conference, 1999. Proceedings of the 1999
Conference_Location :
New York, NY
Print_ISBN :
0-7803-5573-3
Type :
conf
DOI :
10.1109/PAC.1999.792897
Filename :
792897
Link To Document :
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