DocumentCode
3158806
Title
The control of ferroelectric film texture upon rf sputtering
Author
Bakirov, Azamat ; Sviridov, Evgeny ; Dudkevich, Vladimir
Author_Institution
Inst. of Phys., Rostov State Univ., Russia
fYear
1991
fDate
33457
Firstpage
502
Lastpage
503
Abstract
Polycrystalline Pb(Zr0.53Ti0.45W0.01 Cd0.01)O3 films on the stainless steel substrates were fabricated by rf sputtering of stoichiometric ceramic targets in an O2 atmosphere. The effect of potential Ub biasing the substrate with respect to the high-frequency discharge plasma on film microstructure was studied. It was established that the main effect is the formation of the (001) texture at Ub <-20 V on nonorienting substrates. The origin of this effect is discussed
Keywords
crystal microstructure; ferroelectric thin films; lead compounds; sputter deposition; texture; PbZr0.53Ti0.45W0.01Cd0.01O3; RF sputtering; ferroelectric film; microstructure; polycrystalline films; stainless steel substrates; texture; Crystal microstructure; Crystallization; Ferroelectric films; Optical films; Plasma temperature; Radio frequency; Reflection; Sputtering; Substrates; X-ray diffraction;
fLanguage
English
Publisher
ieee
Conference_Titel
Applications of Ferroelectrics, 1994.ISAF '94., Proceedings of the Ninth IEEE International Symposium on
Conference_Location
University Park, PA
Print_ISBN
0-7803-1847-1
Type
conf
DOI
10.1109/ISAF.1994.522414
Filename
522414
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