• DocumentCode
    3158806
  • Title

    The control of ferroelectric film texture upon rf sputtering

  • Author

    Bakirov, Azamat ; Sviridov, Evgeny ; Dudkevich, Vladimir

  • Author_Institution
    Inst. of Phys., Rostov State Univ., Russia
  • fYear
    1991
  • fDate
    33457
  • Firstpage
    502
  • Lastpage
    503
  • Abstract
    Polycrystalline Pb(Zr0.53Ti0.45W0.01 Cd0.01)O3 films on the stainless steel substrates were fabricated by rf sputtering of stoichiometric ceramic targets in an O2 atmosphere. The effect of potential Ub biasing the substrate with respect to the high-frequency discharge plasma on film microstructure was studied. It was established that the main effect is the formation of the (001) texture at Ub <-20 V on nonorienting substrates. The origin of this effect is discussed
  • Keywords
    crystal microstructure; ferroelectric thin films; lead compounds; sputter deposition; texture; PbZr0.53Ti0.45W0.01Cd0.01O3; RF sputtering; ferroelectric film; microstructure; polycrystalline films; stainless steel substrates; texture; Crystal microstructure; Crystallization; Ferroelectric films; Optical films; Plasma temperature; Radio frequency; Reflection; Sputtering; Substrates; X-ray diffraction;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Applications of Ferroelectrics, 1994.ISAF '94., Proceedings of the Ninth IEEE International Symposium on
  • Conference_Location
    University Park, PA
  • Print_ISBN
    0-7803-1847-1
  • Type

    conf

  • DOI
    10.1109/ISAF.1994.522414
  • Filename
    522414