DocumentCode
3158847
Title
Failure analysis of a VLSI double metal microprocessor using advanced tools
Author
Porat, Ran
Author_Institution
Nat. Semicond., Migdal Ha´´emek, Israel
fYear
1991
fDate
5-7 Mar 1991
Firstpage
61
Lastpage
64
Abstract
Finding what went wrong in a VLSI chip that failed is difficult due to the technology complexity. The search for the process step causing the failure is key in the analysis procedure. This paper describes the failure analysis of a high performance 32-bit microprocessor chip. In this failure analysis, advanced tools like e-beam and focused ion beam were used. These tools helped in the investigation leading to a full understanding of the failure mode
Keywords
VLSI; failure analysis; metallisation; microprocessor chips; 32-bit microprocessor chip; VLSI double metal microprocessor; analysis procedure; electron beam testing; failure analysis; Automatic testing; Electron beams; Electronic equipment testing; Failure analysis; Ion beams; Microprocessors; Probes; Scanning electron microscopy; Transistors; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Electrical and Electronics Engineers in Israel, 1991. Proceedings., 17th Convention of
Conference_Location
Tel Aviv
Print_ISBN
0-87942-678-0
Type
conf
DOI
10.1109/EEIS.1991.217712
Filename
217712
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