Title :
High-efficiency CVD multi-layer thin-film silicon solar cells
Author :
Zheng, Guang Fu ; Sproul, Alistair B. ; Wenham, Stuart R. ; Green, Martin A.
Author_Institution :
Centre for Photovoltaic Devices & Syst., New South Wales Univ., Kensington, NSW, Australia
Abstract :
We present new results for high-efficiency multilayer thin-film silicon solar cells deposited by CVD (chemical vapour deposition) onto electrically inactive p++-type CZ silicon substrates. The cell isolation and the substrate thinning applied to the cells can enhance the short-circuit current density, open-circuit voltage, the fill-factor, and hence achieve higher energy-conversion efficiency. For n-p-n-p-n active layers of a total thickness of 17-μm combined with a 15-μm-thick p+-type buffer layer, the resulting CVD multi-layer thin-film silicon solar cells exhibit a Voc of 664.2 mV, a Jsc of 32.9 mA/cm2, a FF of 82.5%, and an energy-conversion efficiency of 17.6%, as measured by Sandia National Laboratories, which is the highest efficiency ever reported for thin-film silicon solar cells deposited onto an inert substrate
Keywords :
CVD coatings; current density; elemental semiconductors; semiconductor thin films; short-circuit currents; silicon; solar cells; substrates; 15 mum; 17 mum; 17.6 percent; 664.2 mV; CVD; Sandia National Laboratories; Si; Si solar cells; cell isolation; chemical vapour deposition; electrically inactive p++-type CZ silicon substrates; energy-conversion efficiency; fill-factor; high-efficiency; higher energy-conversion efficiency; inert substrate; multilayer thin-film silicon solar cells; n-p-n-p-n active layers; open-circuit voltage; p+-type buffer layer; short-circuit current density; substrate thinning; Buffer layers; Chemical vapor deposition; Current density; Nonhomogeneous media; Photovoltaic cells; Semiconductor thin films; Silicon; Sputtering; Substrates; Voltage;
Conference_Titel :
Photovoltaic Specialists Conference, 1996., Conference Record of the Twenty Fifth IEEE
Conference_Location :
Washington, DC
Print_ISBN :
0-7803-3166-4
DOI :
10.1109/PVSC.1996.564044