DocumentCode
3159933
Title
In-situ control in zone-melting recrystallization process for formation of high-quality thin film polycrystalline Si
Author
Kawama, Y. ; Takami, A. ; Naomoto, H. ; Hamamoto, S. ; Ishihara, Takuya
Author_Institution
Photovoltaic Devices Technol. Center, Mitsubishi Electr. Corp., Hyogo, Japan
fYear
1996
fDate
13-17 May 1996
Firstpage
481
Lastpage
484
Abstract
Newly developed zone-melting recrystallization (ZMR) apparatus for formation of thin film polycrystalline Si is introduced. In ZMR method, the fine temperature control is required for formation of high quality crystal over the large area with high uniformity. Therefore, monitoring of melting zone by means of CCD camera was employed. In this system, the width of melting zone was kept constant by controlling the output power of melting heater based on monitoring CCD-image. Reliability of this controlling system was confirmed by evaluating the quality of ZMR-Si by changing scanning speed and output power of melting heater which corresponds to the width of melting zone. As a result, {100} oriented thin film polycrystalline Si (0.3-3 μm thick) with low dislocation density of 2-3×106 cm-2 was successfully obtained all over 6" φ substrate
Keywords
elemental semiconductors; recrystallisation; semiconductor growth; semiconductor thin films; silicon; temperature control; zone melting; zone melting recrystallisation; 0.3 to 3.0 mum; Si; fine temperature control; high-quality thin film polycrystalline Si; melting heater; output power; scanning speed; zone-melting recrystallization process; Charge coupled devices; Charge-coupled image sensors; Monitoring; Power generation; Process control; Semiconductor thin films; Substrates; Temperature control; Thin film devices; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 1996., Conference Record of the Twenty Fifth IEEE
Conference_Location
Washington, DC
ISSN
0160-8371
Print_ISBN
0-7803-3166-4
Type
conf
DOI
10.1109/PVSC.1996.564048
Filename
564048
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