• DocumentCode
    3160405
  • Title

    Cu-Cu Bonding Alternative to Solder based Micro-Bumping

  • Author

    Ruythooren, Wouter ; Beltran, Amaia ; Labie, Riet

  • Author_Institution
    IMEC vzw, Leuven
  • fYear
    2007
  • fDate
    10-12 Dec. 2007
  • Firstpage
    315
  • Lastpage
    318
  • Abstract
    High strength Cu-Cu thermo-compression bonds have been obtained at temperatures as low as 210degC. The bonded Cu surfaces were prepared by diamond bit cutting from electroplated structures. The electrical yield of bump chains depends on bonding temperature and bump size. At bonding temperatures of 300degC and over, bumps of 15 and of 20 mum diameter are bonded with high yield. Below 300degC, the yield decreases strongly for the larger bumps. However, chains made up of 15 mum bumps show high yield when bonded at 250 or 230degC, and still show 70% yield when bonded at 210degC. The electrical resistance of the bonded interface was too small to be determined separately. In shear testing, failure of the bumps does not occur at the bonded interface but after strong plastic deformation or as delamination of another interface.
  • Keywords
    copper; cutting; diamond; electroplating; lead bonding; Cu; bump chains; bumps failure; diamond bit cutting; electrical resistance; electrical yield; electroplated structures; interface delamination; plastic deformation; shear testing; size 15 mum; temperature 210 C; temperature 230 C; temperature 250 C; temperature 300 C; thermo-compression bonds; Atmospheric measurements; Conductive adhesives; Delamination; Electric resistance; Planarization; Plastics; Stacking; Temperature dependence; Testing; Wafer bonding;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics Packaging Technology Conference, 2007. EPTC 2007. 9th
  • Conference_Location
    Singapore
  • Print_ISBN
    978-1-4244-1323-2
  • Electronic_ISBN
    978-1-4244-1323-2
  • Type

    conf

  • DOI
    10.1109/EPTC.2007.4469706
  • Filename
    4469706