DocumentCode
3160405
Title
Cu-Cu Bonding Alternative to Solder based Micro-Bumping
Author
Ruythooren, Wouter ; Beltran, Amaia ; Labie, Riet
Author_Institution
IMEC vzw, Leuven
fYear
2007
fDate
10-12 Dec. 2007
Firstpage
315
Lastpage
318
Abstract
High strength Cu-Cu thermo-compression bonds have been obtained at temperatures as low as 210degC. The bonded Cu surfaces were prepared by diamond bit cutting from electroplated structures. The electrical yield of bump chains depends on bonding temperature and bump size. At bonding temperatures of 300degC and over, bumps of 15 and of 20 mum diameter are bonded with high yield. Below 300degC, the yield decreases strongly for the larger bumps. However, chains made up of 15 mum bumps show high yield when bonded at 250 or 230degC, and still show 70% yield when bonded at 210degC. The electrical resistance of the bonded interface was too small to be determined separately. In shear testing, failure of the bumps does not occur at the bonded interface but after strong plastic deformation or as delamination of another interface.
Keywords
copper; cutting; diamond; electroplating; lead bonding; Cu; bump chains; bumps failure; diamond bit cutting; electrical resistance; electrical yield; electroplated structures; interface delamination; plastic deformation; shear testing; size 15 mum; temperature 210 C; temperature 230 C; temperature 250 C; temperature 300 C; thermo-compression bonds; Atmospheric measurements; Conductive adhesives; Delamination; Electric resistance; Planarization; Plastics; Stacking; Temperature dependence; Testing; Wafer bonding;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronics Packaging Technology Conference, 2007. EPTC 2007. 9th
Conference_Location
Singapore
Print_ISBN
978-1-4244-1323-2
Electronic_ISBN
978-1-4244-1323-2
Type
conf
DOI
10.1109/EPTC.2007.4469706
Filename
4469706
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