Title :
Quantum efficiencies exceeding unity in amorphized silicon layers
Author_Institution :
Lab. PHASE, CNRS, Strasbourg, France
Abstract :
There are two main limitations to the performance of Si solar cells: the fundamental (band-to-band) absorption threshold; and the single electron-hole pair generation by more or less energetic photons. An investigation in the UV and visible light range has been carried out on solar cells with surface layers totally amorphized by implantation. An additional photocurrent has been observed over the whole range of measured wavelengths from λ=400 to 1300 nm in comparison with a single-crystal Si reference solar cell of good quality. This considerable improvement is due to two phenomena: an internal quantum efficiency largely above unity in the UV and visible; and a near-infrared improvement. Contrary to single-crystal impact ionization which is limited by the semiconductor band-gap, the observed effect in amorphized materials is of a sub-gap nature. Unfortunately, this phenomenon is unstable and disappears with integrated light intensity
Keywords :
amorphous semiconductors; electron-hole recombination; elemental semiconductors; energy gap; impact ionisation; ion implantation; semiconductor device testing; silicon; solar cells; 400 to 1300 nm; Si; UV light range; a-Si solar cells; band-to-band absorption threshold; electron-hole pair generation; fundamental absorption threshold; implantation; internal quantum efficiency; near-infrared improvement; performance tests; photocurrent; quantum efficiencies; sub-gap phenomenon; visible light range; Amorphous materials; Electromagnetic wave absorption; Impact ionization; Optical surface waves; Photoconductivity; Photonic band gap; Silicon; Solar power generation; Surface treatment; Wavelength measurement;
Conference_Titel :
Photovoltaic Specialists Conference, 1996., Conference Record of the Twenty Fifth IEEE
Conference_Location :
Washington, DC
Print_ISBN :
0-7803-3166-4
DOI :
10.1109/PVSC.1996.564062