DocumentCode
3163353
Title
Low loss deep glass waveguides produced with dry silver electromigration process
Author
Chuang, Ricky W. ; Lee, Chin C.
Author_Institution
Dept. of Electr. & Comput. Eng., California Univ., Irvine, CA, USA
fYear
2001
fDate
2001
Firstpage
655
Lastpage
658
Abstract
We report a simple but effective technology adopted to fabricate low-loss channel waveguides on a specially chosen glass substrate code name SBS450 without the presence of molten chemicals or liquid solutions. This technique encompasses a dry ion electromigration process that totally eliminate the needs of evaporating separate gold or aluminum film electrodes onto both sides of glass. In contrast to earlier ion exchange waveguides reported, a relatively high electrical field of 545 V/mm was applied to the glass to speed up the electromigration process and most important of all, to prevent silver ions that were driven into the glass from reducing into silver atom, a major contributor to waveguide loss. The channel waveguides thus fabricated showed no discolors or cracks, while the attenuation losses were later measured to be less than 0.2 dB/cm, using our 0.6328 μm He-Ne laser edge-coupling setup
Keywords
electromigration; ion exchange; optical fabrication; optical glass; optical losses; optical waveguides; silver; 0.6328 micron; Ag; He-Ne laser edge-coupling; SBS450; attenuation loss; dry silver electromigration; electric field; fabrication; glass substrate; ion exchange; optical channel waveguide; Aluminum; Atomic beams; Chemical technology; Electrodes; Electromigration; Glass; Gold; Liquid waveguides; Silver; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference, 2001. Proceedings., 51st
Conference_Location
Orlando, FL
ISSN
0569-5503
Print_ISBN
0-7803-7038-4
Type
conf
DOI
10.1109/ECTC.2001.927799
Filename
927799
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