DocumentCode
3163564
Title
Nanoimprint lithography-A key "engine" to nanotechnology research and commercialization today
Author
Chou, S.Y.
Author_Institution
Dept. of Electr. Eng., Princeton Univ., NJ, USA
fYear
2002
fDate
6-8 Nov. 2002
Firstpage
4
Abstract
Summary form only given. Nanoimprint lithography (NIL) has increasingly been recognized as a key nanomanufacturing technology that will play a critical role in commercialization of nanostructures. In this talk, we will overview the development of NIL technologies (machines, masks, resists, and processes) and applications in the NanoStructure Laboratory at Princeton University.
Keywords
masks; nanolithography; resists; reviews; NIL technologies; NanoStructure Laboratory; Princeton University; commercialization; machines; masks; nanoimprint lithography; nanomanufacturing technology; nanostructures; nanotechnology; overview; processes; resists; Biomedical optical imaging; Commercialization; Laboratories; MOSFETs; Nanolithography; Nanotechnology; Semiconductor lasers; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-031-3
Type
conf
DOI
10.1109/IMNC.2002.1178515
Filename
1178515
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