Title :
Nanoimprint lithography-A key "engine" to nanotechnology research and commercialization today
Author_Institution :
Dept. of Electr. Eng., Princeton Univ., NJ, USA
Abstract :
Summary form only given. Nanoimprint lithography (NIL) has increasingly been recognized as a key nanomanufacturing technology that will play a critical role in commercialization of nanostructures. In this talk, we will overview the development of NIL technologies (machines, masks, resists, and processes) and applications in the NanoStructure Laboratory at Princeton University.
Keywords :
masks; nanolithography; resists; reviews; NIL technologies; NanoStructure Laboratory; Princeton University; commercialization; machines; masks; nanoimprint lithography; nanomanufacturing technology; nanostructures; nanotechnology; overview; processes; resists; Biomedical optical imaging; Commercialization; Laboratories; MOSFETs; Nanolithography; Nanotechnology; Semiconductor lasers; Substrates;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-031-3
DOI :
10.1109/IMNC.2002.1178515
