• DocumentCode
    3163651
  • Title

    OPC feature extraction method from reticle SEM image

  • Author

    Ikeda, T. ; Miyano, Y. ; Kotani, T. ; Shibata, T. ; Ikenaga, O.

  • Author_Institution
    Process & Manuf. Eng. Center, Toshiba Corp., Yokohama, Japan
  • fYear
    2002
  • fDate
    6-8 Nov. 2002
  • Firstpage
    14
  • Lastpage
    15
  • Abstract
    Authors developed the method to extract automatically the features of OPC shape from reticle SEM images with high accuracy, using combination of discriminant analysis and non-linear curve-fitting.
  • Keywords
    curve fitting; feature extraction; photolithography; proximity effect (lithography); reticles; scanning electron microscopy; OPC feature extraction; discriminant analysis; nonlinear curve fitting; photolithography; reticle SEM image; Area measurement; Error correction; Feature extraction; Gravity; Image analysis; Lithography; Manufacturing processes; Position measurement; Semiconductor device manufacture; Shape measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
  • Conference_Location
    Tokyo, Japan
  • Print_ISBN
    4-89114-031-3
  • Type

    conf

  • DOI
    10.1109/IMNC.2002.1178520
  • Filename
    1178520
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3163651