DocumentCode :
3163665
Title :
Thermal Interactions Between Electromigration Test Structures
Author :
Schafft, Harry A. ; Albers, John
Author_Institution :
National Bureau Of Standards
fYear :
1988
fDate :
22-23 Feb. 1988
Firstpage :
132
Lastpage :
137
Keywords :
Electrical resistance measurement; Electromigration; Electronic equipment testing; Electronic packaging thermal management; Heat sinks; Metallization; Semiconductor device measurement; Temperature; Thermal resistance; Thermal stresses;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronic Test Structures, 1988. ICMTS. Proceedings of the 1988 IEEE International Conference on
Conference_Location :
Long Beach, CA, USA
Type :
conf
DOI :
10.1109/ICMTS.1988.672948
Filename :
672948
Link To Document :
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