Title :
Nano-lithography using self-assembled block-copolymer for patterned media
Author :
Asakawa, K. ; Hiraoka, T. ; Hieda, H. ; Sakurai, M. ; Kamata, Y. ; Naito, K.
Author_Institution :
Corporate Res. & Dev. Center, Toshiba Corp., Japan
Abstract :
Block-copolymers are known to generate nano-scale microdomains by microphase-separation, if they are annealed at a temperature lower than their order-disorder transition temperatures. We tried to transfer microdomains onto substrates by only using the reactive-ion etching method, which is widely used in semiconductor manufacturing processes. Regarding the application of this nano-patterning technique, we demonstrated the first circumferential magnetic patterned media for hard disk, which were prepared on a 2.5-inch diameter glass plate.
Keywords :
annealing; hard discs; lithography; nanotechnology; phase separation; polymer blends; self-assembly; sputter etching; 2.5 inch; annealing; hard disk; microdomain generation; microphase separation; nanolithography; patterned medium; reactive ion etching; self-assembled block copolymer; semiconductor manufacturing; Annealing; Etching; Glass; Magnetic films; Magnetic separation; Physics; Polymer films; Resists; Self-assembly; Substrates;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-031-3
DOI :
10.1109/IMNC.2002.1178523
