Title :
Pattern defects of nanoimprint in atmospheric conditions
Author :
Hiroshima, H. ; Komuro, M. ; Kasahara, N. ; Kurashima, Y. ; Taniguchi, J. ; Miyamoto, I.
Author_Institution :
Adv. Semicond. Res. Center, Nat. Inst. of Adv. Ind. Sci. & Technol., Japan
Abstract :
A nanoimprint technology is a promising candidate to fabricate sub-50 nm patterns with high-throughput and low cost. Especially, the nanoimprint using photo solidification is suitable for precise patterning because of suppression of pattern placement errors due to thermal expansion and/or strain of mold and wafer generated by high pressure between them. However, when nanoimprint is carried out in air with rather low pressure, a small volume of air remained in concave mold pattern gives rise to pattern defects (called as bubble defects) in the replicated patterns. In this paper, we investigate characteristics of generation of bubble defects in atmospheric conditions´ nanoimprint.
Keywords :
bubbles; lithography; nanotechnology; solidification; 50 nm; atmospheric conditions; bubble defect; nanoimprint lithography; pattern replication; photosolidification; Fluctuations; Fluid flow; Image motion analysis; Optical films; Optical polymers; Surface tension; Test pattern generators; Testing;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-031-3
DOI :
10.1109/IMNC.2002.1178524