Title :
The motivation and challenges of direct writing on semiconductor wafers
Author_Institution :
Taiwan Semicond. Manuf. Co. Inc., Hsin-Chu, Taiwan
Abstract :
For decades, catadioptric optical lithography has continuously been incrementally extended to meet the need of the semiconductor industry. The three parameters to improve resolution, wavelength, numerical aperture (NA) and k/sub 1/ reduction, are reaching their limits. The author reviews the motivations and challenges to meet present and near future demands.
Keywords :
nanolithography; photolithography; catadioptric optical lithography; numerical aperture; resolution; wavelength; CMOS logic circuits; Cost function; Fixtures; Lithography; Optical imaging; Printing; Resists; Throughput; Ultraviolet sources; Writing;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-031-3
DOI :
10.1109/IMNC.2002.1178527
