Title :
Intrinsic Mechanism of Drain-Lag and Current Collapse in GaN-Based HEMTs
Author :
Hu, W.D. ; Chen, X.S. ; Lu, W.
Author_Institution :
Nat. Lab. for Infrared Phys., Shanghai Inst. of Tech. Phys., Shanghai
Abstract :
The intrinsic mechanism of drain-lag and current collapse in GaN-based high-electron-mobility-transistors are studied by using two-dimensional transient simulations. The simulated drain-lag characteristics are in good agreement with the reported experimental data. Dynamic pictures of trapping of hot electron under drain-pulse voltages are discussed in detail. The trapped charges may accumulate at gate edge drain side, where the electric field significantly changes, causing a notable current collapse. Quantum-well HEMT structures have been proposed and demonstrated to obtain the optimized performance.
Keywords :
III-V semiconductors; gallium compounds; high electron mobility transistors; quantum well devices; semiconductor device models; wide band gap semiconductors; GaN; GaN-based HEMT; current collapse; drain-lag; high-electron-mobility-transistors; hot electron trapping; quantum-well HEMT structures; two-dimensional transient simulations; Computational modeling; Electron traps; HEMTs; Intrusion detection; MODFETs; Numerical simulation; Pulse measurements; Quantum well devices; Radio frequency; Voltage;
Conference_Titel :
Microelectronics and Electron Devices, 2009. WMED 2009. IEEE Workshop on
Conference_Location :
Boise, ID
Print_ISBN :
978-1-4244-3551-7
Electronic_ISBN :
978-1-4244-3552-4
DOI :
10.1109/WMED.2009.4816142