Electron energy deposition in photoresist: a local view

The authors examine electron scattering processes in resist materials using a direct Monte Carlo model, combined with a virtual quanta method. They separate the scattering events into four types: elastic, ionization, excitation, and plasmon events. The model is stochastic, in the sense that the electrons travel in free flight between the interactions. This code has the ability to simulate both electron and high energy photon lithographies.