Title :
High-speed proximity effect correction system for electron-beam projection lithography by cluster processing
Author :
Ogino, Koji ; Hoshino, Hiroaki ; Machida, Y. ; Osawa, M. ; Arimoto, H. ; Takahashi, K. ; Yamashita, H.
Author_Institution :
Fujitsu Ltd., Japan
Abstract :
We have proposed the techniques of the pattern shape modification method and the pattern density reduction method as a proximity effect correction (PEC) for electron-beam projection lithography.
Keywords :
electron beam lithography; proximity effect (lithography); cluster processing; electron-beam projection lithography; high-speed proximity effect correction system; Acceleration; Backscatter; Equations; Flowcharts; Laboratories; Lead compounds; Lithography; Parallel processing; Proximity effect; Shape;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-031-3
DOI :
10.1109/IMNC.2002.1178540
