Title :
Evaluation of finished EUVL masks using a Mirau interferometric microscope
Author :
Kinoshita, H. ; Haga, T. ; Hamamoto, K. ; Takada, S. ; Kazui, N. ; Kakunai, S. ; Tsubakino, H. ; Watanabe, T.
Author_Institution :
Himeji Inst. of Technol., Hyougo, Japan
Abstract :
We have developed an EUVL experimental exposure system and demonstrated fine pattern replication less than 60 nm. Using this system, we have evaluated the characteristics of chemical amplitude resists. Also a series of studies for evaluating different type of masks has been carried out to establish mask process, e.g. selection of absorber or buffer material, etching conditions and so on.
Keywords :
etching; light interferometry; masks; nanolithography; optical microscopy; photoresists; ultraviolet lithography; EUVL experimental exposure system; Mirau interferometric microscope; absorber; buffer material; chemical amplitude resists; etching conditions; fine pattern replication; finished EUVL masks; mask process; masks; Scanning electron microscopy;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-031-3
DOI :
10.1109/IMNC.2002.1178545
