Title :
NEXAFS study for optimization of hard DLC films formation with Ar cluster ion beam
Author :
Kitagawa, T. ; Miyauchi, K. ; Kanda, K. ; Shimizugawa, Y. ; Toyoda, N. ; Tsubakino, H. ; Matsui, S. ; Gego, T. ; Matsuo, J. ; Yamada, I.
Author_Institution :
Lab. of Adv. Sci. & Tech. for Ind., Himeji Inst of Tech, Hyogo, Japan
Abstract :
Hard diamond-like carbon (DLC) films have outstanding characteristics with extremely thin film thickness, and will be required for various nano-scale devices. The requirements of this coating are high hardness, smooth surface, and low friction coefficient with thin film thickness below a few nm. The present films made with plasma enhanced CVD process will not be sufficient for hardness to achieve higher recording density in the future. To make films satisfying the above demands, a new method employing Ar cluster ion beam assisted deposition was proposed.
Keywords :
EXAFS; XANES; diamond-like carbon; friction; hardness; ion beam assisted deposition; magnetic recording; surface topography; wear resistant coatings; Ar cluster ion beam; Ar cluster ion beam assisted deposition; C:H; NEXAFS; diamond-like carbon films; hard DLC films; high hardness; low friction coefficient; nano-scale devices; optimization; smooth surface; thin film thickness; Argon; Coatings; Diamond-like carbon; Friction; Ion beams; Nanoscale devices; Plasma density; Plasma properties; Thin film devices; Transistors;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-031-3
DOI :
10.1109/IMNC.2002.1178558
