DocumentCode :
3164402
Title :
Development of EUV wavefront metrology technology in ASET
Author :
Murakami, K. ; Saito, J. ; Ota, K. ; Kondo, H. ; Ishii, M. ; Kawakami, J. ; Oshino, T. ; Sugisaki, K. ; Zhu, Y. ; Suzuki, A. ; Hasegawa, M. ; Sekine, Y. ; Takeuchi, S. ; Ouchi, C. ; Kakuchi, O. ; Watanabe, Y. ; Hasegawa, T. ; Hara, S.
Author_Institution :
EUV Metrol. Technol. Res. Dept., Assoc. of Super-Adv. Electron. Technol., Kanagawa, Japan
fYear :
2002
fDate :
6-8 Nov. 2002
Firstpage :
98
Abstract :
Summary form only given, as follows. We examined several wavefront metrology techniques suitable for EUV optics. Problems are lack of high-coherence light source and limitation of applicable optical elements in the EUV wavelength region. To overcome these problems, we adopted point diffraction interferometry (PDI) and shearing interferometry as candidates of metrology method. To verify the idea, we have designed a simple EUV experimental interferometer, which is now under fabrication. The system can be used as both a PDI and a shearing interferometer, with which we will extract issues on wavefront metrology of relatively high-NA EUV optics and will compare the metrology methods. The detailed system design and progress will be presented at the conference.
Keywords :
light interferometry; ultraviolet lithography; ASET; EUV lithography; point diffraction interferometry; projection optics; shearing interferometry; wavefront metrology technology; Light sources; Metrology; Optical device fabrication; Optical diffraction; Optical interferometry; Shearing; Synchrotrons; System testing; Ultraviolet sources; Undulators;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-031-3
Type :
conf
DOI :
10.1109/IMNC.2002.1178562
Filename :
1178562
Link To Document :
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