Title :
Self-aligned Si Field Emitter Arrays with Precise Control in Tip Sharpness and Gate-Tip Spacing
Author :
Rakhshandehroo, M.R. ; Pang, S.W.
Author_Institution :
The University of Michigan
Keywords :
Dry etching; Fabrication; Field emitter arrays; Insulation; Plasma applications; Plasma density; Plasma devices; Plasma sources; Plasma temperature; Polyimides;
Conference_Titel :
Vacuum Microelectronics Conference, 1997. Technical Digest., 1997 10th International
Conference_Location :
Kyongju, Korea
Print_ISBN :
0-7803-3786-7
DOI :
10.1109/IVMC.1997.627385