DocumentCode :
316451
Title :
Self-aligned Si gate FEAs using Transfer Mold Technique
Author :
Sakai, Tadashi ; Ono, Tomio ; Nakamoto, Masayuki ; Sakuma, Naoshi
Author_Institution :
Advanced Semiconductor Devices Research Lab
fYear :
1997
fDate :
17-21 Aug. 1997
Firstpage :
48
Lastpage :
52
Keywords :
Apertures; Electrodes; Fabrication; Field emitter arrays; Glass; Magnetic materials; Reproducibility of results; Shape; Sputter etching; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 1997. Technical Digest., 1997 10th International
Conference_Location :
Kyongju, Korea
Print_ISBN :
0-7803-3786-7
Type :
conf
DOI :
10.1109/IVMC.1997.627386
Filename :
627386
Link To Document :
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