Title :
A deep X-ray lithography in the "NewSUBARU"
Author :
Mekaru, H. ; Utsumi, Y. ; Hattori, T.
Author_Institution :
Lab. of Adv. Sci. & Technol. for Ind., Himeji Inst. of Technol., Hyogo, Japan
Abstract :
A beam line BL11 is constructed for exposure Hard X-ray Lithography (DXL) in the LIGA. LIGA process, that utilizes a useful industrial application of SR, is one of the promising technologies for fabrication of extremely tall three-dimensional microstructures with a large aspect ratio. Microstructures with height of over a few hundreds /spl mu/m have been widely applied to various fields such as micro-mechanics, micro-optics, sensor and actuator technology, chemical, medical and biological engineering, and so on. This beam line was designed by the criteria; photon energy range 2 keV to 6 keV, a beam spot size on the exposure stage /spl ges/50/spl times/5 min/sup 2/, a density of total irradiated photons /spl ges/10/sup 11/ photons/cm/sup 2/.
Keywords :
LIGA; X-ray lithography; synchrotron radiation; 2 to 6 keV; BL11 beam line; LIGA process; NewSUBARU; aspect ratio; deep X-ray lithography; synchrotron radiation; three-dimensional microstructure; Actuators; Biosensors; Chemical and biological sensors; Chemical technology; Fabrication; Microstructure; Optoelectronic and photonic sensors; Strontium; Textile industry; X-ray lithography;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-031-3
DOI :
10.1109/IMNC.2002.1178567
