A miniaturized electron beam column simulation by the FCM method

Author

Youngchul Kim ; Dae-Wook Kim ; Do Wan Kim ; Seung Joon Ahn ; Chulsu Jo ; Ho-Seob Kim

Author_Institution

Dept. of Phys. & Adv. Material Sci., Sunmoon Univ., Chungnam, South Korea

fYear

2002

fDate

6-8 Nov. 2002

Firstpage

112

Lastpage

113

Abstract

A miniaturized electron beam column, microcolumn, operated at a low electron energy has been simulated by the fast moving least square reproducing kernal point collocation method (FCM) which is new concept in point collocation calculations. The simulation results of FCM for microcolumn configurations show good agreement with previous calculation and experimental results.

Keywords

digital simulation; electron beam focusing; electron beam lithography; electron lenses; FCM method; FCM method dilation function; einzel lens parts; electron beam column design; electron emitter; electron trajectory; fast moving least square reproducing kernal point collocation method; high-aspect-ratio structures; lens structure; microcolumn configurations; microcolumn simulation; miniaturized electron beam column; nodes configuration; point collocation calculations; source lens; Electron beams; Electron emission; Finite difference methods; Finite element methods; Least squares methods; Lenses; Materials science and technology; Mathematics; Mesh generation; Physics;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International

Conference_Location

Tokyo, Japan

Print_ISBN

4-89114-031-3

Type

conf

DOI

10.1109/IMNC.2002.1178569

Filename

1178569