DocumentCode :
316466
Title :
Electron emission characteristics of boron nitride films synthesized by plasma-assisted chemical vapor deposition
Author :
Sugino, Takashi ; Kawasaki, Seiji ; Tanioka, Kazuhiko ; Shirafuji, Junji
Author_Institution :
Department of Electrical Engineering, Osaka University
fYear :
1997
fDate :
17-21 Aug. 1997
Firstpage :
123
Lastpage :
126
Keywords :
Boron; Chemical vapor deposition; Electron emission; Optical films; Plasma applications; Plasma chemistry; Plasma properties; Plasma sources; Stimulated emission; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 1997. Technical Digest., 1997 10th International
Conference_Location :
Kyongju, Korea
Print_ISBN :
0-7803-3786-7
Type :
conf
DOI :
10.1109/IVMC.1997.627401
Filename :
627401
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=316466
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