DocumentCode
316546
Title
Field Emission from Undoped Polycrystalline Diamond Deposited by MPCVD at 520-665 C
Author
Li, Yanbo ; Aslam, Dean M. ; Kwon, Sang J.
Author_Institution
Department of Electrical Engineering, Michigan State University
fYear
1997
fDate
17-21 Aug. 1997
Firstpage
509
Lastpage
512
Keywords
Conductive films; Electron emission; Plasma density; Plasma displays; Plasma immersion ion implantation; Plasma measurements; Plasma temperature; Rough surfaces; Surface roughness; Temperature distribution;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Microelectronics Conference, 1997. Technical Digest., 1997 10th International
Conference_Location
Kyongju, Korea
Print_ISBN
0-7803-3786-7
Type
conf
DOI
10.1109/IVMC.1997.627635
Filename
627635
Link To Document