DocumentCode :
3165483
Title :
A 90 ns 100 K erase/program cycle megabit flash memory
Author :
Kynett, V. ; Anderson, J. ; Atwood, G. ; Dix, P. ; Fandrich, M. ; Jungroth, O. ; Kao, S. ; Kreifels, J.A. ; Lai, S. ; Liou, H.-C. ; Liu, B. ; Lodenquai, R. ; Lu, W.-J. ; Pavloff, R. ; Tang, D. ; Tsau, G. ; Tzeng, J.C. ; Vajdic, B. ; Verma, G. ; Wang, S. ;
Author_Institution :
Intel Corp., Folsom, CA, USA
fYear :
1989
fDate :
15-17 Feb. 1989
Firstpage :
140
Lastpage :
141
Abstract :
An electrically erasable, reprogrammable, 90-ns 1-Mb flash memory capable of greater than 100000 erase/program cycles is described. The memory implements a command port and an internal reference voltage generator, allowing microprocessor-controlled reprogramming. The 90-ns access time results from the 95- mu A memory cell current, low resistance polysilicide word lines, advanced scaled periphery transistors, and a di/dt optimized data-out buffer. Using CMOS inputs, power dissipation is 40 mW in the active state and 20 mu W in standby. The memory electrically erases in 900 ms and programs at the rate of 10 mu s/byte. The device contains thirty-two columns of redundant elements and utilizes flash memory cells to store the address of repaired columns. The memory was fabricated on a 1- mu m double-poly n-well CMOS process. A typical cell erase/program V/sub t/ margin is shown as a function of the number of reprogramming cycles. After 100000 cycles there is still a 2.5-V program-read margin to ensure data retention. Device parameters are listed.<>
Keywords :
CMOS integrated circuits; EPROM; integrated memory circuits; redundancy; 1 Mbit; 1 micron; 20 muW; 40 mW; 90 ns; 900 ms; 95 muA; EEPROM; access time; advanced scaled periphery transistors; command port; double-poly n-well CMOS process; electrically erasable; internal reference voltage generator; megabit flash memory; microprocessor-controlled reprogramming; polysilicide word lines; power dissipation; redundant elements; Degradation; Flash memory; Grounding; Latches; Manufacturing; Packaging; Solid state circuits; Switches; Switching circuits; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Circuits Conference, 1989. Digest of Technical Papers. 36th ISSCC., 1989 IEEE International
Conference_Location :
New York, NY, USA
Type :
conf
DOI :
10.1109/ISSCC.1989.48233
Filename :
48233
Link To Document :
بازگشت