Title :
Wavelength dependence of UV laser cleaning for silicon field emitter arrays
Author :
Kanazawa, Y. ; Sawada, A. ; Zhao, W.J. ; Jarupoonphol, W. ; Takai, M.
Author_Institution :
Res. Center for Mater. Sci. at Extreme Conditions, Osaka Univ., Japan
Abstract :
Field emitter arrays (FEAs) for the flat panel display with high brightness and resolution have drawn much attention as one of the application in vacuum micro electronics. Emission characteristics of FEAs become worth when molecules adsorb on the tip surface. In this study, the desorption of various molecules using an ultra violet (UV) laser has been tried to improve the emission characteristics. The laser photon energy was close to or slightly higher than the binding energies of contaminants. Therefore the photons can directly dissociate the contaminants from the surface and improve the emission characteristics.
Keywords :
electron field emission; elemental semiconductors; laser materials processing; silicon; surface cleaning; vacuum microelectronics; Si; UV laser cleaning; binding energy; contaminant dissociation; molecular desorption; silicon field emitter array; vacuum microelectronics; wavelength dependence; Cleaning; Field emitter arrays; Gas lasers; Laser theory; Materials science and technology; Optical arrays; Silicon; Surface contamination; Surface emitting lasers; Voltage;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-031-3
DOI :
10.1109/IMNC.2002.1178611
