DocumentCode :
316570
Title :
Field Emitter Arrays Made of Ion Beam Modified Photoresist
Author :
Asano, Tanemasa ; Sasaguri, Daisuke ; Shibata, Eiji ; Higa, Katsuya
Author_Institution :
Center for Microelectronic Systems, Kyushu Institute of Technology
fYear :
1997
fDate :
17-21 Aug. 1997
Firstpage :
622
Lastpage :
627
Keywords :
Argon; Conducting materials; Conductivity; Electron emission; Etching; Field emitter arrays; Ion beams; Plasma applications; Resists; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 1997. Technical Digest., 1997 10th International
Conference_Location :
Kyongju, Korea
Print_ISBN :
0-7803-3786-7
Type :
conf
DOI :
10.1109/IVMC.1997.627663
Filename :
627663
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=316570
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