Title :
Nb/sub 2/O/sub 5//SiO/sub 2/ multilayer films formation using O/sub 2/ gas cluster ion beam deposition
Author :
Fujiwara, Y. ; Toyoda, N. ; Yamada, I. ; Sato, M.
Author_Institution :
Lab. of Adv. Sci. & Technol. for Ind., Himeji Inst. of Technol., Hyogo, Japan
Abstract :
In this work, the optical thin films such as Nb/sub 2/O/sub 5/ and SiO/sub 2/ were formed with O/sub 2/ gas cluster ion beam assisted deposition, and structures and stability of Nb/sub 2/O/sub 5//SiO/sub 2/ multi-layer are discussed.
Keywords :
ionised cluster beam deposition; niobium compounds; optical multilayers; silicon compounds; Nb/sub 2/O/sub 5/-SiO/sub 2/; Nb/sub 2/O/sub 5//SiO/sub 2/ multilayer film; O/sub 2/; O/sub 2/ gas cluster ion beam deposition; optical thin film; Acceleration; Atomic force microscopy; Electron beams; Ion beams; Niobium; Nonhomogeneous media; Optical films; Refractive index; Scanning electron microscopy; Testing;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-031-3
DOI :
10.1109/IMNC.2002.1178627
