Title :
Fine pattern etching of molybdenum by using atmospheric line shaped micro plasma source
Author :
Okumura, T. ; Saitoh, M. ; Yashiro, Y. ; Kimura, T.
Author_Institution :
Production Core Eng. Lab., Matsushita Electr. Ind. Co. Ltd., Osaka, Japan
Abstract :
Various atmospheric micro plasma sources for maskless etching have been proposed. This report briefly summarizes the concept of our line shaped micro plasma source and presents fine pattern etching experiment of molybdenum thin film.
Keywords :
metallic thin films; molybdenum; plasma sources; sputter etching; Mo; atmospheric line shaped micro plasma source; fine pattern etching; maskless etching; molybdenum thin film; Atmospheric-pressure plasmas; Electrodes; Etching; Feeds; Helium; Plasma applications; Plasma measurements; Plasma sources; Radio frequency; Substrates;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-031-3
DOI :
10.1109/IMNC.2002.1178630
