DocumentCode
3165925
Title
Fine pattern etching of molybdenum by using atmospheric line shaped micro plasma source
Author
Okumura, T. ; Saitoh, M. ; Yashiro, Y. ; Kimura, T.
Author_Institution
Production Core Eng. Lab., Matsushita Electr. Ind. Co. Ltd., Osaka, Japan
fYear
2002
fDate
6-8 Nov. 2002
Firstpage
234
Lastpage
235
Abstract
Various atmospheric micro plasma sources for maskless etching have been proposed. This report briefly summarizes the concept of our line shaped micro plasma source and presents fine pattern etching experiment of molybdenum thin film.
Keywords
metallic thin films; molybdenum; plasma sources; sputter etching; Mo; atmospheric line shaped micro plasma source; fine pattern etching; maskless etching; molybdenum thin film; Atmospheric-pressure plasmas; Electrodes; Etching; Feeds; Helium; Plasma applications; Plasma measurements; Plasma sources; Radio frequency; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-031-3
Type
conf
DOI
10.1109/IMNC.2002.1178630
Filename
1178630
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