Title :
Practical, cost effective sub-wavelength lithography
Author_Institution :
Numerical Technol. Inc., San Jose, CA, USA
Abstract :
This paper will briefly examine the development of above-wavelength lithography, define the currently available optical extension techniques, explore the importance of integrating these techniques and offer a practical, cost effective approach capable of extending optical lithography to well below the 65 nm technology node.
Keywords :
nanolithography; photolithography; 65 nm; 65 nm technology node; cost effective sub-wavelength lithography; optical extension techniques; Costs; Inspection; Integrated optics; Lithography; Manufacturing processes; Optical materials; Physics; Pulp manufacturing;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-031-3
DOI :
10.1109/IMNC.2002.1178660
