DocumentCode :
3166825
Title :
Will SOI have a life for the low-power market?
Author :
Cai, Jin ; Ren, Zhibin ; Majumdar, Amlan ; Ning, Tak H. ; Yin, Haizhou ; Park, Dae-Gyu ; Haensch, Wilfried E.
Author_Institution :
IBM Res. Div., IBM T. J. Watson Res. Center, Yorktown, NY
fYear :
2008
fDate :
6-9 Oct. 2008
Firstpage :
15
Lastpage :
16
Abstract :
We discuss key challenges for SOI CMOS to achieve sub-100 pA/m leakage current required for low-standby power applications. Recent 45 nm data is used to illustrate the importance of junction engineering to mitigate SOI floating body effect for low leakage design. With device scaling towards 22 nm node, both bulk and SOI technologies are expected to hit a fundamental GIDL limit. Extremely-thin body SOI provides a scaling path for low-leakage SOI. Finally, we identify several unique SOI opportunities that can broaden its appeal to the low power market.
Keywords :
CMOS integrated circuits; leakage currents; silicon-on-insulator; SOI CMOS; SOI floating body effect; junction engineering; leakage current; low-leakage SOI; low-power market; low-standby power applications; CMOS technology; Conference proceedings; Data engineering; Doping; Implants; Leakage current; MOSFETs; Parasitic capacitance; Power engineering and energy; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOI Conference, 2008. SOI. IEEE International
Conference_Location :
New Paltz, NY
ISSN :
1078-621X
Print_ISBN :
978-1-4244-1954-8
Electronic_ISBN :
1078-621X
Type :
conf
DOI :
10.1109/SOI.2008.4656272
Filename :
4656272
Link To Document :
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