Title :
Study of the imaging properties in high N.A. projection optics
Author_Institution :
Core Technol. Center, Nikon Corp., Saitama, Japan
Abstract :
As requiring the higher resolution in photo-lithography, the numerical aperture (NA) of the projection optics is enlarging year by year. It seems obvious that optical resolution is simply proportional to the NA of the optical system. However, this is not exactly valid in high NA imaging because of the vectorial nature of light. We study this problem by using the rigorous diffraction theory.
Keywords :
photolithography; proximity effect (lithography); high NA projection optics; higher resolution; imaging properties; numerical aperture; photo-lithography; rigorous diffraction theory; Apertures; Approximation methods; High-resolution imaging; Lighting; Optical diffraction; Optical imaging; Optical surface waves; Resists; Solid modeling; Tellurium;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-031-3
DOI :
10.1109/IMNC.2002.1178674
