DocumentCode
3167038
Title
Study of the imaging properties in high N.A. projection optics
Author
Otaki, K.
Author_Institution
Core Technol. Center, Nikon Corp., Saitama, Japan
fYear
2002
fDate
6-8 Nov. 2002
Firstpage
324
Lastpage
325
Abstract
As requiring the higher resolution in photo-lithography, the numerical aperture (NA) of the projection optics is enlarging year by year. It seems obvious that optical resolution is simply proportional to the NA of the optical system. However, this is not exactly valid in high NA imaging because of the vectorial nature of light. We study this problem by using the rigorous diffraction theory.
Keywords
photolithography; proximity effect (lithography); high NA projection optics; higher resolution; imaging properties; numerical aperture; photo-lithography; rigorous diffraction theory; Apertures; Approximation methods; High-resolution imaging; Lighting; Optical diffraction; Optical imaging; Optical surface waves; Resists; Solid modeling; Tellurium;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-031-3
Type
conf
DOI
10.1109/IMNC.2002.1178674
Filename
1178674
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