DocumentCode :
3167065
Title :
Self-assembly of micro-stage using micro-origami technique on GaAs
Author :
Kubota, K. ; Fleischmann, T. ; Saravanan, S. ; Vaccaro, P.O. ; Aida, T.
Author_Institution :
ATR Adaptive Commun. Res. Labs, Kyoto, Japan
fYear :
2002
fDate :
6-8 Nov. 2002
Firstpage :
326
Abstract :
Summary form only given. A simple method to make self-positioned micromachined structure is desirable to fabricate complex 3-dimensional structures for micro-electro-mechanical-system. Recently, we demonstrated a method to make self-positioned micromachined structures by using a hinge which is composed of a pair of lattice-mismatched epitaxial layers. As an application example, a standing mirror was fabricated using epitaxial growth of III-V compound semiconductors. In this study, we propose a method to make more complex structure using two types of hinges which bend toward opposite directions like "tani-ori" (valley-fold) and "yama-ori" (mountain-fold) in origami.
Keywords :
III-V semiconductors; gallium arsenide; micromechanical devices; self-assembly; semiconductor epitaxial layers; Al/sub 0.52/Ga/sub 0.48/As; GaAs; lattice-mismatched epitaxial layers; micro-electro-mechanical-system; self-assembly; self-positioned micromachined structure; Capacitive sensors; Epitaxial growth; Epitaxial layers; Fasteners; Gallium arsenide; Optical microscopy; Scanning electron microscopy; Self-assembly; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-031-3
Type :
conf
DOI :
10.1109/IMNC.2002.1178675
Filename :
1178675
Link To Document :
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