DocumentCode :
3167103
Title :
The novel deflector for multi arrayed microcolumn using MEMS technology
Author :
Hak Kim ; Changho Han ; Kukjin Chun
Author_Institution :
Sch. of Electr. Eng. & Comput. Sci., Seoul Nat. Univ., South Korea
fYear :
2002
fDate :
6-8 Nov. 2002
Firstpage :
330
Lastpage :
331
Abstract :
We present a novel design concept of deflectors for a 3 × 3 multiple arrayed microcolumn and its fabrication process using a improved microfabrication and novel MEMS technology, such as multi wafer anodic bonding techniques and copper electroplating for the double metallization process. The double metallization process is a newly introduced interconnection method to reduce wiring among the components. Moreover, a difference in the signal delay between pad site and each deflector pole, which was caused by multi interconnection structure, was calculated using the SPICE simulator with an equivalent circuit model. The calculation results were obtained with about 3ns signal delay difference. Therefore, in these arrayed systems, this method is very useful for checking the difference in signal delay.
Keywords :
SPICE; copper; electroplating; interconnections; metallisation; micromechanical devices; nanotechnology; wafer bonding; Cu; MEMS technology; SPICE simulator; copper electroplating; deflectors; double metallization process; equivalent circuit model; interconnection method; microfabrication; multi arrayed microcolumn; multi wafer anodic bonding; Circuit simulation; Copper; Delay; Fabrication; Integrated circuit interconnections; Metallization; Micromechanical devices; SPICE; Wafer bonding; Wiring;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-031-3
Type :
conf
DOI :
10.1109/IMNC.2002.1178677
Filename :
1178677
Link To Document :
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