DocumentCode
3167326
Title
A revisited pseudo-MOSFET model for ultrathin SOI films
Author
Rodriguez, N. ; Cristoloveanu, S. ; Gámiz, F.
Author_Institution
Dept. de Electron., Univ. of Granada, Granada
fYear
2008
fDate
6-9 Oct. 2008
Firstpage
65
Lastpage
66
Abstract
The pseudo-MOS transistor (Psi-MOSFET) is a quick technique for monitoring SOI wafers. Based on Poisson numerical simulations, we derive updated models for the characterization of ultrathin films, accounting for the density of traps of passivated and nonpassivated surfaces. These analytical models match the experimental results and are useful for accurate parameter extraction.
Keywords
MOSFET; Poisson equation; semiconductor device models; semiconductor thin films; silicon-on-insulator; Poisson numerical simulations; Si; nonpassivated surfaces; passivated surfaces; pseudoMOSFET model; ultrathin SOI films; Conference proceedings; Decision support systems; Quadratic programming;
fLanguage
English
Publisher
ieee
Conference_Titel
SOI Conference, 2008. SOI. IEEE International
Conference_Location
New Paltz, NY
ISSN
1078-621X
Print_ISBN
978-1-4244-1954-8
Electronic_ISBN
1078-621X
Type
conf
DOI
10.1109/SOI.2008.4656296
Filename
4656296
Link To Document