DocumentCode
3168405
Title
Impact of back-gate biasing on ultra-thin silicon-on-insulator-based nanoribbon sensors
Author
Fernandes, P.G. ; Chapman, R.A. ; Seitz, O. ; Stiegler, H.J. ; Wen, H.-C. ; Chabal, Y.J. ; Vogel, E.M.
Author_Institution
Dept. Of Electr. Eng., Univ. of Texas at Dallas, Dallas, TX, USA
fYear
2010
fDate
11-14 Oct. 2010
Firstpage
1
Lastpage
2
Abstract
For over 30 years, field effect transistors (FETs) have been used as ion sensors [1]. In the past, IonSensitive-FETs were based on bulk MOSFET designs and the reference electrode was used to bias the device [2]. Recently, functionalized silicon nanowires and nanoribbons have been used to detect a variety of species including proteins and single viruses [3-4]. These designs allow for gating of the device from the back, across the buried oxide of the wafer [3-4]. Careful consideration must be given to the interaction of the liquid media and coupling effects with the FET. This is paramount to the determination of the operating region of the sensor. In this work, we investigate the effects and advantages of applying a back gate bias on SOIFET-based chem-/biosensors. Further, we look at the different responses of dynamic and static DC measurements on pH and protein (biotin-streptavidin) sensors.
Keywords
MOSFET; biosensors; chemical sensors; field effect transistors; nanosensors; nanowires; silicon; silicon-on-insulator; MOSFET; SOIFET; back gate bias; biosensors; chemical sensor; field effect transistors; ion sensors; nanoribbon sensors; pH sensors; protein sensors; silicon nanowires; ultra thin silicon-on-insulator; Couplings; FETs; Logic gates; Sensor phenomena and characterization; Silicon; Voltage measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
SOI Conference (SOI), 2010 IEEE International
Conference_Location
San Diego, CA
ISSN
1078-621x
Print_ISBN
978-1-4244-9130-8
Electronic_ISBN
1078-621x
Type
conf
DOI
10.1109/SOI.2010.5641066
Filename
5641066
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