DocumentCode :
3168660
Title :
Low threshold voltage quarter micron MOSFETs for low power applications
Author :
Zongjian Chen ; Plummer, J.D.
Author_Institution :
Center for Integrated Syst., Stanford Univ., CA, USA
fYear :
1995
fDate :
9-11 Oct. 1995
Firstpage :
78
Lastpage :
79
Abstract :
Low threshold voltage, high performance, quarter micron N/P MOSFETs for 1 V applications were fabricated. A 4.5/spl times/ reduction in switching power with the same switching speed was achieved, when compared with standard Vt devices operated at a higher supply voltage. The feasibility of lowering standby power using substrate bias was shown. The challenges of scaling low Vt devices down to shorter channel lengths and possible scaling approaches are discussed.
Keywords :
MOSFET; characteristics measurement; leakage currents; channel lengths; leakage currents; low power applications; quarter micron MOSFETs; scaling approaches; standby power; substrate bias; switching power; switching speed; threshold voltage; Circuit simulation; Doping; FETs; Leakage current; Low voltage; MOSFETs; Performance analysis; Performance gain; Process design; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Low Power Electronics, 1995., IEEE Symposium on
Conference_Location :
San Jose, CA, USA
Print_ISBN :
0-7803-3036-6
Type :
conf
DOI :
10.1109/LPE.1995.482471
Filename :
482471
Link To Document :
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